发明名称 Semiconductor circuit including non-ESD transistors with reduced degradation due to an impurity implant
摘要 A plurality of transistors according to the present invention formed on a semiconductor wafer including a plurality of non-ESD transistors, the plurality of non-ESD transistors including spacer regions and impurity implant regions encroaching the spacer regions, and a plurality of ESD transistors, the plurality of ESD transistors formed at a predetermined angular offset from the non-ESD transistors. Further, the plurality of ESD transistors include the spacer regions and impurity implant regions encroaching the spacer regions further than the impurity implant regions of the non-ESD transistors.
申请公布号 US5814864(A) 申请公布日期 1998.09.29
申请号 US19960620099 申请日期 1996.03.21
申请人 ADVANCED MICRO DEVICES, INC. 发明人 LIU, DAVID K. Y.
分类号 H01L27/02;(IPC1-7):H01L23/62;H01L29/04 主分类号 H01L27/02
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