发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition capable of forming a molded product having sufficient mechanical characteristics, heat resistance and dimensional accuracy free from deformation with time, especially suitable for optically three-dimensional molding, holographic three-dimensional molding, etc. SOLUTION: This photosensitive resin composition comprises (A) a metallocene compound having light absorption at 400-700nm wavelength, especially bis(η<5> -2,4-cyclopentadien-1-yl)-bis[2,6-difluoro-3-(pyrrol-1-yl)phenyl]titan ium, (B) a nitrogen-containing vinyl compound having >=80 deg.C glass transition temperature of a homopolymer and (C) a urethane (meth)acrylate oligomer containing two or more ethylenic unsaturated groups.
申请公布号 JPH10259219(A) 申请公布日期 1998.09.29
申请号 JP19970085699 申请日期 1997.03.19
申请人 JSR CORP 发明人 CHIBA HIDEKI
分类号 B29C35/08;B29C67/00;C08F290/06;C08K5/3415;C08L75/16;(IPC1-7):C08F290/06;C08K5/341 主分类号 B29C35/08
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