发明名称 |
Sputtering system using cylindrical rotating magnetron electrically powered using alternating current |
摘要 |
A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.
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申请公布号 |
US5814195(A) |
申请公布日期 |
1998.09.29 |
申请号 |
US19960736978 |
申请日期 |
1996.10.25 |
申请人 |
THE BOC GROUP, INC. |
发明人 |
LEHAN, JOHN;BYORUM, HENRY;HILL, RUSSELL J.;ROUGH, J. KIRKWOOD |
分类号 |
C23C14/34;C23C14/35;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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