发明名称 |
Anti-reflective coating composition |
摘要 |
A water-soluble coating composition for forming a layer to be placed on the upper surface of a resist is provided without use of Freons. The material includes an aqueous solution containing a) at least one water-soluble polymer selected from the group consisting of poly(N-vinylpyrrolidone) homopolymers and water-soluble copolymers of N-vinylpyrrolidone and other vinyl monomers, b) at least one fluorine-containing organic acid, and c) at least one amino acid derivative. The film formed through use of the material of the invention serves as both an anti-reflective film and a protective film. The material of the present invention provides a number of advantages in the formation of resist patterns, including excellent film-forming properties, excellent dimensional accuracy and aligning accuracy, simple and easy handling, high productivity, and good reproducibility.
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申请公布号 |
US5814694(A) |
申请公布日期 |
1998.09.29 |
申请号 |
US19970833052 |
申请日期 |
1997.04.03 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE, SATOSHI;NAGURA, SHIGEHIRO;ISHIHARA, TOSHINOBU |
分类号 |
C08K5/09;(IPC1-7):C08K5/09 |
主分类号 |
C08K5/09 |
代理机构 |
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地址 |
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