发明名称 SUBSTRATE TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To fully provide a substrate treating apparatus which prevents specified different treatments from being affected with each other by the other atmosphere. SOLUTION: A substrate treating apparatus has two treatment spaces A and B partitioned by a bulkhead 200 extending in vertical direction. Each treatment space A and B includes a plurality of stories. In the treatment space A, a plurality of treatment units to perform the treatment before exposure are arranged. In the treatment space A, a carry unit 11 is arranged, and in the treatment space B, a carry unit 21 is arranged. A delivery chamber SH is arranged covering the treatment chamber A and the treatment chamber B. In the delivery chamber SH, a delivery unit 31 which performs the delivery of a substrate with the carry unit 11 in the treatment space A, and the carry unit 21 in the treatment chamber B is provided.
申请公布号 JPH10261689(A) 申请公布日期 1998.09.29
申请号 JP19970065218 申请日期 1997.03.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MORITA AKIHIKO;OTANI MASAMI;IMANISHI YASUO;TSUJI MASAO;IWAMI MASAKI;NISHIMURA JOICHI
分类号 H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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