发明名称 |
Method of forming polymide patterns on substrates |
摘要 |
Disclosed is a method of forming a pattern on a substrate. A first solution is formed of an organic solvent and monomers of diamine and dianhydride. The monomers are polymerized to form a polyamic acid soluble in the organic solvent. About 20 to about 95% of the amic acid groups in the polyamic acid are imidized to form a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is formed. This can be accomplished by precipitating the partially imidized polyamic acid from the first solution and dissolving it in a second organic solvent to form a second solution. The second solution is applied to the substrate and the solvent is evaporated to form a coating of the partially imidized polyamic acid on the substrate. A portion of the coating is removed to form a pattern on the substrate and the remaining partially imidized polyamic acid is fully imidized on the substrate. |
申请公布号 |
SG52539(A1) |
申请公布日期 |
1998.09.28 |
申请号 |
SG19960005740 |
申请日期 |
1994.07.25 |
申请人 |
OCCIDENTAL CHEMICAL CORPORATION |
发明人 |
CHOI JIN-O |
分类号 |
B41M1/12;C09D179/08;G03F7/023;G03F7/038;H01L21/48;H01L23/498;(IPC1-7):G03F7/038 |
主分类号 |
B41M1/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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