发明名称 Lithographic lens wavefront and distortion tester
摘要 A measurement device (2) for measuring a collimated wave front through a lithographic lens includes a radiant energy source (4), a lens group (6) for collimating light emitted from said radiant energy source and directing said collimated light (7) toward a reference surface (10). A first binary optic (12) disposed in line with said collimated light and located adjacent to an input conjugate of a lens under test. A second binary optic (18) is arranged in a spaced relationship and in line with said first binary optic for retroreflecting light passing through a lithographic lens disposed between said first and second binary optics. A recording system (8,9) is provided for recording an interference with the light retroreflected-reflected back through said lens and through said reference surface.
申请公布号 US5815268(A) 申请公布日期 1998.09.29
申请号 US19960672291 申请日期 1996.06.28
申请人 RAYTHEON COMPANY 发明人 LAFLEUR, L. DAVID
分类号 G01J9/00;(IPC1-7):G01B9/02 主分类号 G01J9/00
代理机构 代理人
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