发明名称 HOLE INSPECTION PATTERN STRUCTURE FOR VIA HOLE
摘要 PROBLEM TO BE SOLVED: To inspect whether a via hole is correctly opened or not, with no upgraded precision in positioning when a via hole is formed. SOLUTION: On a semiconductor substrate 2, an inspection wiring 3 used for inspecting opening of a via hole 6 is formed, and an insulating film 4 is formed on the inspection wiring 3. To the inspection wiring 3, two wire holes are so allocated that a bottom surface touches both the inspection wiring 3 and the insulating film 4. Respective via holes 6 are allocated on both ends of the inspection wiring 3, while being mutually displaced in the opposite direction to wiring-width direction of the inspection wiring 3.
申请公布号 JPH10256366(A) 申请公布日期 1998.09.25
申请号 JP19970053455 申请日期 1997.03.07
申请人 NEC CORP 发明人 KINOSHITA YASUSHI
分类号 H01L21/66;H01L21/768;H01L23/544;(IPC1-7):H01L21/768 主分类号 H01L21/66
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