| 摘要 |
PROBLEM TO BE SOLVED: To provide a vertical substrate treatment device, which can shorten a treatment time. SOLUTION: In a substrate treatment device, wherein the specified processing is performed in a processing part with a substrate 9b in the upright standing state being conveyed upward. an input part 43 and a delivery part 42 are provided. At first, a substrate 9a is set at the input part 43 in the vertical attitude, and the input part 43 and a guide frame part 42 are rotated in arrow marks C2 and C3. At the next step, when a shaft 434a of a cylinder 434 is withdrawn, the substrate is mounted on the delivery part 42. Thereafter, the input part 43 and the guide frame part 42 are rotated into the opposite directions of the arrow marks C2 and C3, and the substrate is arranged so as to get the vertical attitude at the lower side of the treatment part 2. Then, the substrate 9b is carried so as to pass the inside of the treatment part 2. By this method, the substrate is carried up and down at the vertical attitude and can be readily treated continuously, and the throughput can be increased. |
