THIN FILM DEVICE AND MANUFACTURE OF THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a thin film device and a manufacturing method of a thin film capable of forming a thin film having excellent characteristics by locally controlling the substrate temperature when forming the thin film and having no adverse effect on a peripheral region of the thin film. SOLUTION: A micro heater 5 is locally set correspondingly to the thin film formed region R when forming a lower electrode 7 and a piezoelectric thin film 8, and by supplying the micro heater with power, only the temperature of the substrate region corresponding to the thin film formed region R is raised to the extent suitable for the temperature required for the thin film formation. While the thin film 8 having an excellent characteristic is formed in the region of the thin film formed region R thus heated as above, the temperature elevation in the substrate region other than the thin film formed region R is suppressed, the problem caused by the diffusion of the thin film material into the processing circuit formed region and a significantly degraded performance of the processing circuit caused by the rediffusion of the impurity already introduced into the semiconductor substrate 2 can be resolved.