发明名称 METHOD FOR MEASURING PHASE OF PHASE SHIFT MASK AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To measure the phase difference of a phase shift film and the uniformity of the phase shift film at high speed. SOLUTION: A DUV(deep ultraviolet) laser beam is made into two-frequency orthogonal linearly polarized light R by a frequency shifter 14. This two- frequency orthogonal linearly polarized light R is separated by every polarized light component by a second polarization beam splitter 23. One of the light beams is transmitted through the entire surface of a photomask 10 and the other is passed through respective mirrors 25, 26 and again these light rays are synthesized again by a third polarization beam splitter 27. The interference light generated at this time is converted to an interference signal Q by a photodetector 29. The phase difference of the phase shift film 2 is determined from the phase difference between this interference signal Q and the reference signal (s).
申请公布号 JPH10254118(A) 申请公布日期 1998.09.25
申请号 JP19970053333 申请日期 1997.03.07
申请人 TOSHIBA CORP 发明人 FUJIWARA TAKESHI
分类号 G03F1/26;G03F1/68;H01L21/027 主分类号 G03F1/26
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