发明名称 SEMICONDUCTOR STRUCTURE AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a new structure, especially a CMOS structure, decreasing off-state current of a device. SOLUTION: A MOS transistor 70 contains two trench isolation regions 78 adjoining an active region 79. The trench isolation regions 78 is disposed on the opposite sides of the active region 79 so that side walls 80 of each trench acts as an interface for the active region 79, and at least one of the side walls 80 has inclination of 90-150 deg.. The trench isolation regions 78, a source injection region and a drain injection region 78 surround all sides of the active region 79.
申请公布号 JPH10256394(A) 申请公布日期 1998.09.25
申请号 JP19980038650 申请日期 1998.02.20
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 DONALD C WHEELER;LEWIS L SUU;MANDELMAN JACK A;REBECCA D MI
分类号 H01L21/76;H01L21/762;H01L21/8238;H01L27/092;H01L29/78;H01L29/786;(IPC1-7):H01L21/823 主分类号 H01L21/76
代理机构 代理人
主权项
地址