| 摘要 |
PROBLEM TO BE SOLVED: To easily improve mass productivity, and facilitate connection with a light part by forming a pattern latent image by irradiating the light by forming a photosensitive substance in a layer shape in a part where a light waveguide is formed, forming a light waveguide pattern by removing a light unirradiated part by a solvent, and selecting this photosensitive substance from a group composed of a photosensitive oligomer and a photosensitive film. SOLUTION: A process (a) of forming a photosensitive substance in a layer shape in a part where a light waveguide is formed, a process (c) of forming a pattern latent image by irradiating the light to a prescribed part of the photosensitive substance and a process of removing the other part of a light unirradiated photosensitive substance by a solvent, are provided. A light waveguide pattern is formed by using a pattern latent image unformed part as a core part of the light waveguide. This photosensitive substance is selected from a group composed of a photosensitive oligomer and a photosensitive film. That is, a film is hardened by light irradiation, and is developed by a proper solvent, and the waveguide pattern having a sharp and smooth wall surface can be formed. |
