| 摘要 |
PROBLEM TO BE SOLVED: To form an even deep recess having an accurate opening width to improve the optical coupling efficiently of optical fibers with semiconductor elements by aligning an element forming photo mask with the crystal orientation of a semiconductor substrate to form a pattern. SOLUTION: The manufacturing method comprises forming an SiN film and first pattern on an Si substrate, forming an crystal orientation recess 402, removing the SiN film, forming a thermal Si oxide film as a second etching mask film, forming a photo mask for forming a ferrule fixing pattern aligned with the tangent of the side face of the recess 402 and surface of the Si substrate, photo etching to form a ferrule fixing pattern and optical semiconductor element fixing aligning pattern, anisotropically etching to form a ferrule fixing recess 403 and aligning mark for fixing optical semiconductor element, thereby eliminating the relative position deviation of the recess 403 to the element fixing aligning mark. |
