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发明名称
Verfahren zur Ablagerung von Fluor-enthaltenden Silizium-Dioxid-Schichten
摘要
申请公布号
DE69224924(T2)
申请公布日期
1998.09.24
申请号
DE19926024924T
申请日期
1992.01.17
申请人
NEC CORP., TOKIO/TOKYO, JP
发明人
HOMMA, TETSUYA, C/O NEC CORPORATION, MINATO-KU, TOKYO 108-01, JP
分类号
H01L21/283;C23C16/40;H01L21/314;H01L21/316;H01L21/768;H01L23/522;(IPC1-7):H01L21/316;C23C16/04
主分类号
H01L21/283
代理机构
代理人
主权项
地址
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