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发明名称
Dielektrikum-Sputtertarget mit hoher Festigkeit und ein Verfahren zu dessen Herstellung
摘要
申请公布号
DE19721989(C2)
申请公布日期
1998.09.24
申请号
DE19971021989
申请日期
1997.05.26
申请人
MITSUBISHI MATERIALS CORP., TOKIO/TOKYO, JP
发明人
WATANABE, KAZUO, OMIYA, SAITAMA, JP;MISHIMA, AKIFUMI, OMIYA, SAITAMA, JP
分类号
C04B35/46;C04B35/465;C23C14/08;C23C14/34;H01L21/203;H01L21/314;H01L21/316;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):C23C14/34
主分类号
C04B35/46
代理机构
代理人
主权项
地址
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