发明名称 |
Method of production of electron source substrate provided with electron emitting elements and method of production of image forming apparatus using the substrate |
摘要 |
<p>A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit. <IMAGE> <IMAGE></p> |
申请公布号 |
EP0866486(A2) |
申请公布日期 |
1998.09.23 |
申请号 |
EP19980302130 |
申请日期 |
1998.03.20 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MIYAMOTO, MASAHIKO;HASEGAWA, MITSUTOSHI;SANDO, KAZUHIRO;SHIGEOKA, KAZUYA |
分类号 |
B41J2/01;H01J9/02;H01L41/09;(IPC1-7):H01J9/02 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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