发明名称 |
Reticle assembly having non-superposed position measurement patterns |
摘要 |
In a reticle (or mask) assembly including a plurality of reticles (or masks) for manufacturing a semiconductor device, each of the reticles (or masks) having a plurality of I-shaped (or L-shaped) patterns for position measurement, the I-shaped (or L-shaped) patterns are not superposed on each other on the semiconductor device, and coordinate values determined by the I-shaped (or L-shaped) patterns of one of the reticles (or masks) on the semiconductor coincide with coordinate values determined by the I-shaped (or L-shaped) patterns of another of the reticles (or masks) on the semiconductor device. |
申请公布号 |
US5812244(A) |
申请公布日期 |
1998.09.22 |
申请号 |
US19970840762 |
申请日期 |
1997.04.16 |
申请人 |
NEC CORPORATION |
发明人 |
TONOOKA, YOJI;NISHIGUCHI, TAKAO;OKADA, TAKEHIKO |
分类号 |
G03F1/08;G03F1/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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