发明名称 POLISHING LIQUID COMPOSITION AND POLISHING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a polished face of high accuracy and high quality free from a big projection, by using a polishing liquid composition containing the water, the polycrystalline diamond of less than a specific average size, and the grinding oil. SOLUTION: A polishing liquid composition contains the water, a polishing material and the grinding oil. As the polishing material, the polycrystalline diamond of less than 0.3 microns m of average size, particularly preferably 0.01-0.3 micron m, is used. As the grinding oil, the containing a glycol component and a surfactant, is used. As the surfactant, an anion surfactant or the like is used, As the glycol component, at least one kind selected from the derivatives such as polyethylene glycol, is used. As a typical polishing method, the polishing ids performed by bringing the abrasive cloth, an abrasive pad and a abrasive tape into contact with a surface to be plished, while supplying the polishing liquid composition on the same. Whereby a hard disc substrate free from the roughness, the burr, the burying of abrasive, or the like can be obtained.
申请公布号 JPH10249713(A) 申请公布日期 1998.09.22
申请号 JP19970051987 申请日期 1997.03.06
申请人 MITSUBISHI CHEM CORP 发明人 MORI DAISUKE
分类号 B24B1/00;B24B37/00;G11B5/84 主分类号 B24B1/00
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