发明名称 APPARATUS FOR STEREO LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To prevent thickening of an uncured resin layer locally as compared with a predetermined value by sucking an excess amount of the uncured resin by a pipette so that a liquid level of a part to become a shape of liquid reservoir of a shaping material becomes a predetermined height, or discharging the insufficient amount of the uncured resin. SOLUTION: A pipette component 6 for sucking and discharging resin can be moved parallel to a liquid level of UV curable resin 1 by a pipette component driving means 7, and also moved in a Z-axis direction. When pipette component drive data 9 that a liquid reservoir exists in a shape model is transmitted from a stereo lithographic system control circuit, the means 7 is moved to the reservoir. And, the uncured resin liquid level of the reservoir is measured by a height sensor 10. When it is higher than a predetermined height, the resin 1 is sucked by the component 6 until it becomes the predetermined height. Contrary, when the liquid level of the reservoir is lower than a predetermined height, the uncured resin is discharged from the component 6 until it becomes the predetermined height.
申请公布号 JPH10249944(A) 申请公布日期 1998.09.22
申请号 JP19970054424 申请日期 1997.03.10
申请人 HITACHI LTD 发明人 OZAWA MASAHIKO;GOTO NORIO;ENDO TOSHIRO;WADA KIYOSHI;MURANAKA MASAYUKI
分类号 B29C31/04;B29C35/08;B29C67/00;B29K105/24;B29L9/00;G05D9/00;(IPC1-7):B29C67/00 主分类号 B29C31/04
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