| 摘要 |
An equipment for surface treatment according to the present invention comprises a chamber capable of exhausting gas, a revolving stage disposed in said chamber for placing a material to be treated thereon, a quartz plate serving as a gap controlling means spaced from the material to be treated such that a gap between said revolving stage and said material to be treated is provided not to exceed 0.5 mm for forming a space of treatment, the quartz plate being provided with a gas supplying means for supplying a reactive gas containing oxygen into the space of treatment, and a gas exciting means provided on the a side of said quartz plate opposite that on which the material to be treated is located for exciting the oxygen contained in said reactive gas into metastable oxygen atoms. |
