| 摘要 |
The present invention is directed to a process for forming a layer of palladium on a substrate, comprising: preparing a solution of a palladium precursor, wherein the palladium precursor consists ofPd(OOCR1)m(OOCR2)nwherein R1 is hydrogen, alkyl, alkenyl, alkynyl, -R3COOH, alkyl from 1 to 5 carbons substituted with one or two hydroxyl groups, R2 is hydrogen, alkyl, alkenyl, alkynyl, -R3COOH, alkyl from 1 to 5 carbon atoms substituted with one or two hydroxyl groups, -CHO, R3 is alkyl, and alkyl groups from 1 to 5 carbon atoms substituted with one or two hydroxyl groups m and n are real numbers or fractions, and m+n=2; applying the palladium precursor to the surface of the substrate; decomposing the palladium precursor by subjecting the precursor to heat. |
