发明名称 HIGH-PURITY SILICA GLASS FABRICATING METHOD USING SOL-GEL PROCESS
摘要 <p>There is provided a high-purity silica glass fabricating method using a sol-gel process. In the method, a first sol is formed by mixing 100 parts by weight of fumed silica powder with between 100 to 300 parts by weight of deionized water. The first sol is gelled, dried, powdered, and thermally treated. A second sol is formed by mixing the thermally-treated first sol with between 100 to 200 parts by weight of deionized water and 20 to 50 parts by weight of non-thermally treated original fumed silica powder. The second sol is gelled, dried, and sintered. Thus, a high-purity silica glass is formed.</p>
申请公布号 WO1998040318(A1) 申请公布日期 1998.09.17
申请号 KR1998000045 申请日期 1998.03.10
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