High temperature superconductor reactive vapour deposition

摘要

In a process for applying a high temperature superconductor layer onto a substrate, especially a long metal strip, by reactive vapour deposition of the layer elements (especially yttrium, barium and copper) while supplying oxygen, the oxygen is supplied to the substrate by continuously reciprocating an oxygen distribution slide (17) positioned just below the substrate. Also claimed is an apparatus for carrying out the above process, including an oxygen distribution slide (17) which reciprocates parallel to and just below the substrate and which has adjacent open-top oxygen supply channels (29) located between layer element passage openings (37).