发明名称 |
Electrode for semiconductor device and method of manufacturing it |
摘要 |
<p>A semiconductor device comprising a semiconductor substrate having active regions electrically isolated from each other on a predetermined surface thereof, and a single layer or multilayer electrode line arranged on said semiconductor substrate through an insulating layer, wherein at least one layer of said electrode line is close-packed plane oriented, and a full width at half maximum of a close-packed plane diffraction profile ofθ-scan as a measure of an orientation distribution being less than 6 DEG , and said full width at half maximum of the close-packed plane diffraction profile ofθ-scan is measured by using X-ray diffraction. <IMAGE></p> |
申请公布号 |
EP0865083(A2) |
申请公布日期 |
1998.09.16 |
申请号 |
EP19980107810 |
申请日期 |
1990.07.02 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
HASUNUMA, MASAHIKO;KANEKO, HISASHI;SAWABE, ATSUHITO;KAWANOUE, TAKASHI;KOHANAWA, YOSHIKO;KOMATSU, SHUICHI |
分类号 |
C30B25/14;H01L21/28;H01L21/285;H01L21/3205;H01L21/822;H01L23/52;H01L23/532;H01L27/04;H01L29/41;(IPC1-7):H01L23/485 |
主分类号 |
C30B25/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|