发明名称 Electrode for semiconductor device and method of manufacturing it
摘要 <p>A semiconductor device comprising a semiconductor substrate having active regions electrically isolated from each other on a predetermined surface thereof, and a single layer or multilayer electrode line arranged on said semiconductor substrate through an insulating layer, wherein at least one layer of said electrode line is close-packed plane oriented, and a full width at half maximum of a close-packed plane diffraction profile ofθ-scan as a measure of an orientation distribution being less than 6 DEG , and said full width at half maximum of the close-packed plane diffraction profile ofθ-scan is measured by using X-ray diffraction. <IMAGE></p>
申请公布号 EP0865083(A2) 申请公布日期 1998.09.16
申请号 EP19980107810 申请日期 1990.07.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HASUNUMA, MASAHIKO;KANEKO, HISASHI;SAWABE, ATSUHITO;KAWANOUE, TAKASHI;KOHANAWA, YOSHIKO;KOMATSU, SHUICHI
分类号 C30B25/14;H01L21/28;H01L21/285;H01L21/3205;H01L21/822;H01L23/52;H01L23/532;H01L27/04;H01L29/41;(IPC1-7):H01L23/485 主分类号 C30B25/14
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