Polyhydroxy compound and a positive photoresist containing the same

摘要

A polyhydroxy compound represented by the following formula (I): <IMAGE> (I) and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): <IMAGE> (c) which is satisfactory in properties such as sensitivity, resolution, tau -value and peeling off resistance.