发明名称 EXPOSURE DEVICE, SEMICONDUCTOR PRODUCTION SYSTEM AND MANUFACTURE OF SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To reduce the complicatedness of the maintenance of information on exposure work and the complicatedness of a control of the information by a method wherein the complicatedness is reduced so that the information on the exposure work, which is necessary to a semiconductor exposure, can be transferred between arbitrary units. SOLUTION: A semiconductor aligner 10 communicates with other semiconductor aligner 20 and a host computer 30 via a network 40 by a communication control program 11. An equipment control program 12 executes a control of equipments and a storage unit 14 stores jobs necessary to an exposure work. An information-on- exposure-work control program 13 makes a check on the presence or absence of the jobs necessary to the exposure work and executes a control of input and output between the program 13 and the unit 14. Moreover, the program 13 has a function to make an inquiry about information on the exposure wirk to the other units and at the same time, has a function to respond to the inquiry about the information on the exposure work from the other units. A production control program 32 indicates the start of the exposure work to the units 10 and 20, which are coupled with each other through the network 40, and at the same time, specifies the kind of the information on the exposure work to be used by those units 10 and 20.
申请公布号 JPH10247616(A) 申请公布日期 1998.09.14
申请号 JP19970063984 申请日期 1997.03.04
申请人 CANON INC 发明人 NAKAMURA TAKU
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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