| 摘要 |
PROBLEM TO BE SOLVED: To recognize the existence of a large defect in a comparatively earlier stage and to improve the efficiency of an inspection system. SOLUTION: A pattern defect inspection device for inspecting the defect of a photomask used at the time of manufacturing a semiconductor element or the pattern of a semiconductor wafer and the defect of the pattern of a liquid crystal substrate is provided with a comparison circuit 32 comparing a design pattern image data generated based on design data with observation data obtained based on the transmission light or the reflected light of light radiated on a sample and judgment circuits 33 and 36 judging the presence of the detect of the pattern based on a comparison result in the comparison circuit and judging whether the size of the defect of the pattern is larger than a size which is previously set. When the judgment circuits judge that the size of the defect detected during the execution of inspection is larger than the size of the defect which is previously set, inspection is temporarily stopped. |
