| 摘要 |
PROBLEM TO BE SOLVED: To manufacture the diffraction optical element efficiently with high precision. SOLUTION: A substrate W coated with a resist 11 after being baked is fixed to a rotary stage 10 of an exposure device, and rotated and exposed to an (i) beam of a 1st high energy beam E1 obliquely and simultaneously at the blazed angle of the outer peripheral circumference. The exposed area A1 senses the high-energy beam E1 to become an alkali solution. Then the innermost area A2 in the obliquely exposed area is exposed from above to KrF excimer laser light of a 2nd high-energy beam E2. In this area A2, acid is produced from triphenyl sulfonium triphylite by the KrF exposure and the absorption band of bromphenyl blue shifts to the (i)-beam area, so that the transmissivity to the (i) beam decreases. |
