ARRAY SUBSTRATE AND ITS PRODUCTION AS WELL AS REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To obtain a reflection type LCD with which the scatterability of the reflected light from a substrate is improved and high image quality is assured by forming the surfaces of the interlayer insulation surfaces of the spacings between reflection electrodes to rugged structures. SOLUTION: The light scattering regions 108a, 108b are disposed in the spacings between reflection electrodes 109a and 109b and between 109b and 109e. These regions are formed by subjecting the surfaces of the interlayer insulation layer 107a to 107c to the rugged structure treatments. The correlation insulation layer 107 is applied on the substrate 101 formed with thin-film transistors(TFTs) to a matrix form over the entire surface. In succession, contact holes are formed by a photolithographic process and an aluminum(Al) is deposited and formed as the reflection electrodes 109. This Al is thereafter patterned by a dry etching method. At this time, the etching rates of the Al which is the reflection electrodes 109 and the interlayer insulation layer 107 vary considerably and, therefore, the Al is etched to the desired patterns and thereafter, only the surfaces of the interlayer insulation layers between the reflection electrodes are subjected to the rugged structure treatments.