SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device which is reduced in installation area in a substrate transporting unit. SOLUTION: A quarter cylindrical space is formed above one corner section on the upper surface of the main body section 10 of a substrate processing unit 1 by forming a circular actuate recessed section 14 at one corner section of a treatment chamber 11 on the main body section 10. Then cylindrical space 2 is formed by arranging a plurality of substrate processing units 1 around the center axis S so that their quarter cylindrical spaces may be brought closer to each other. A transportation camber 30 supported by a transpiration chamber supporting arm 31 from the top side is disposed in the space 20. In the transportation chamber 30, two substrate housing chambers 40a and 40b are provided so that the chamber 40a and 40b may be rotated around the vertical axis and moved in the vertical direction and substrate holding sections which hold substrates are respectively provided in the chambers 40a and 40b so that the holding sections may be moved forward and backward in the horizontal direction.