| 摘要 |
PROBLEM TO BE SOLVED: To perform uniform polishing by a small quantity of abrasive by supplying the abrasive in an atomized state to a work object surface in a fixed injection quantity. SOLUTION: A surface plate 11 is rotated, and an abrasive 16 is supplied in an atomized state onto a polisher 12 from an abrasive supply part 15. A workpiece 13 is pressed against the polisher 12 under prescribed pressure, and is polished. A first negative pressure generating part 25 sucks the abrasive 16 is a tank 18 through a suction nozzle 21 and a first flow regulating value 22. It is mixed with the atmosphere taken in through a section flow regulating value 27, and is formed as a lean atomized abrasive 16, and is outputted to a second negative pressure generating part 30. The second negative pressure generating part 30 similarly mixes it with a constant quantity of high pressure air from a third flow regulating valve 32, and makes it leaner, and injects it into the polisher 12. By this constitution, uniform polishing can be performed. |
