发明名称 ELECTROPLATING COMPOSITION AND PROCESS
摘要 The invention presented relates to (a) novel complexes of cobalt salts and copolymers of maleic anhydride, ethylenediamine and epichlorohydrin; (b) electroplating compositions for deposit of zinc-cobalt alloys wherein the cobalt is employed in the form of a complex of the above type; and (c) a process for the electrodeposition of bright zinc-cobalt alloys using the latter compositions. Optionally, the electroplating compositions also contain minor amounts of at least one of poly(ethylenediamine); a polycondensate of a di-alkyl diallylammonium chloride and sulfur dioxide; a polycondensate of ethylenediamine, epichlorohydrin and dichloroethane; a polycondensate of piperazine, formaldehyde, epichlorohydrin and thiourea; the reaction product of dimethylaminopropylamine with epichlorohydrin; a polycondensate of tetraethylenepentamine and epichlorohydrin; the reaction product of imidazole with epichlorohydrin; the reaction product of hexamethylenetetramine with epichlorohydrin; a polycondensate of poly(ethylenediamine) and epichlorohydrin; or a polycondensate of morpholine, imidazole, and epichlorohydrin.
申请公布号 CA2073478(C) 申请公布日期 1998.09.15
申请号 CA19922073478 申请日期 1992.07.08
申请人 MACDERMID, INCORPORATED 发明人 DOBROVOLSKIS, PRANAS;KASHTALYANOVA, NINA;KUPETIS, GYTIS-KAZIMERAS;BUDILOVSKI, JULIUS
分类号 C25D3/56;(IPC1-7):C25D3/56;C25D3/12 主分类号 C25D3/56
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