DEPOSITION OF THIN FILMS

摘要

Method and apparatus for depositing thin films of materials suitable for use as optical coatings, dielectric insulating layers, barrier coatings et al. Chemical precursors of the material to be deposited are transported to a vacuum deposition chamber where deposition takes place under the action of a chemically reactive species and kinetically energetic species. The optical and other qualities of material so produced is shown to depend critically on the ratio of chemically reactive species to chemical precursor.