| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain information on a specific pattern without damaging a sample by a method wherein an energy beam is irradiated simultaneously at repetitive patterns of the same structure on an electronic device and generated light, generated X-rays and the like are detected simultaneously. SOLUTION: Electrons are derived from an electron source 1 by using a drawing electrode 2, the radiation angle of an electron beam is set to nearly 0 by an electrostatic lens 3 and an electromagnetic lens 4, and the electron beam is incident on a mask 6 which is manufactured so as to match a pattern to be observed. After the electron beam has been transmitted through the mask 6, it is relatively incident on repetitive patterns. Auger electrons, of a sample 7, generated from the beam are spectrally diffracted by a CMA-type electron spectroscope 5 so as to be detected, and a spectrum is obtained. Thereby, when light, X-rays, electrons and the like are detected simultaneously, it is possible to obtain information on a specific pattern without damaging the sample.</p> |
