发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide the photosensitive polyimide precursor composition capable of being exposed to line (i) and line (g) of a mercury vapor tube and developed with a practicable sensitivity by satisfying a specified relation between the electron affinity of an acid anhydride and the ionization potential of diamine. SOLUTION: The photosensitive polyimide precursor composition contains the following polymer and a sensitizer. The acid dianhydride has an average electron affinity of 1.3-1.80eV and this composition contains 3,3',4,4'- diphenylsulfone-tetracarboxylic acid dianhydride. The diamine compound represented by formula II or III and each of the diamine groups has its ortho positions nonsbstituted by any group except H. An average ionization potential of the total diamine component is 7.25-7.44eV, and the difference obtained by taking the average electron affinity of the acid dianhydride from this average ionization potential is 5.5-5.80eV, and this polymer is represented by formula I in which R<1> is an acid residue, R<2> is diamine residue, and R<3> is a specified group.
申请公布号 JPH10239841(A) 申请公布日期 1998.09.11
申请号 JP19970045747 申请日期 1997.02.28
申请人 TORAY IND INC 发明人 TOMIKAWA MASAO;YOSHIMURA TOSHIO;MIURA YASUO
分类号 G03F7/027;C08L79/08;G03F7/031;G03F7/038;H01L21/027;H01L21/312;(IPC1-7):G03F7/027 主分类号 G03F7/027
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