发明名称 MULTI-LEVEL EXPOSING METHOD USING TWO-DIMENSIONAL MATRIX TYPE SPATIAL OPTICAL MODULATING ELEMENT
摘要 PROBLEM TO BE SOLVED: To speedily expose a photosensitive material with multi-levels by determining one selection line on a time-division basis among mutually different lines after multiple scanning. SOLUTION: When gray level is '0' on a 1st line, write data of image data write scanning timing lines (a) to (c) are all turned off. Consequently, output light are all turned off and the exposure time of the photosensitive material becomes zero. When the gray level is '5', write data of the image data scanning timing lines (a) to (c) are set on, off, and on. Consequently, the output line is turned on for a time Tab+Tca and the exposure time of the photosensitive material becomes (15/7)nτ. When the gray level is '7', the write data of the image data write scanning timing lines (a) to (c) are all turned on. Consequently, the output line is ON for a time Tab+Tba+Tca and the exposure time of the photosensitive material becomes 3nτ.
申请公布号 JPH10239665(A) 申请公布日期 1998.09.11
申请号 JP19970042068 申请日期 1997.02.26
申请人 FUJI PHOTO FILM CO LTD 发明人 KIMURA KOICHI
分类号 G02B26/08;G02F1/133;G03B27/72;G09G3/20;H01L51/50;(IPC1-7):G02F1/133 主分类号 G02B26/08
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