FOCUSING ION BEAM WORKING METHOD AND ITS DEVICE

摘要

PROBLEM TO BE SOLVED: To achieve a focusing ion beam working device where beams do not become obscure even if an ion beam current value varies and movement loci of a beam do not remain even if two or more sections are worked continuously, and three-dimensional working and copy working can be performed and, at the same time, the ion beam current is able to be stabilized. SOLUTION: A plasma ion source is used as an ion source for a focusing ion beam. Inner walls keeping plasma 1 except a reference electrode 4 which gives potential to plasma 1 and an ion extraction electrode 5 which extracts ions 3 from plasma 1 are covered with insulating materials. An absolute value of an ion beam current is continuously controlled from 0 to 10μA within 0-100V in an absolute value of the potential by applying an ion extraction voltage between the reference electrode 4 and the ion extracting electrode 5.