发明名称 TREATMENT LIQUID TREATING METHOD AND CONTINUOUSLY TREATING APPARATUS OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To bring a small amount of treatment liquid uniformly into contact with a substrate, and enable treating many substrates, by spreading treatment liquid on a substrate by using a nozzle, blowing gas against the substrate by using a jet nozzle, stretching the treatment liquid on the whole surface of the substrate, and eliminating the treatment liquid spread on the substrate from it. SOLUTION: Aqua knives 1 have specified intervals for uniformly spreading releasing liquid on a substrate from the upper surface direction. Air knives 2 have specified intervals for uniformly streching the releasing liquid spread by the aqua knives 1, in the backward direction to the carrying direction of a substrate, bringing the whole part of the substrate into contact with the releasing liquid, and blowing gas uniformly against the substrate in order to eliminate the releasing liquid from the rear of the substrate. This releasing equipment is provided with, e.g. four, pairs of combination of the aqua knife 1 and the air knife 2. The time when a sensor 3 detects the position of a substrate is set as reference, and the starting times of the spreading by the aqua knives 1 and the gas blowing by the air knives 2 are determined.
申请公布号 JPH10242047(A) 申请公布日期 1998.09.11
申请号 JP19970353330 申请日期 1997.12.22
申请人 TORAY IND INC 发明人 KAKINUKI TAKEHIRO;SUZUKI TETSUO;GOTO TETSUYA;YOSHIOKA MASAHIRO
分类号 G03F7/30;B05C11/06;G03F7/42;H01L21/027;H01L21/304;H01L21/306;(IPC1-7):H01L21/027 主分类号 G03F7/30
代理机构 代理人
主权项
地址