发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To minimize the reticle replacing time by placing at least an SMIF indexer at a reticle transfer height enough to take out a substrate from an SMID pod with its door opened to carry the pod between the indexer and mount. SOLUTION: A reticle SMIF indexer 2 is disposed at a front left part of an aligner chamber 2 and its pot mounting face is higher by a given amount from the reticle transfer height. At a front left part of the chamber 1 a pot mount 3 and mount lift 4 to move the mount 3 up and down from near a height of 800mm above the floor to near the pod mount face height of the indexer 2. Above the indexer 2 and lift 4 a robot hand 5 and vertically and horizontally moving means 6 are disposed to thereby minimize the reticle replacing time and reticle contamination during carrying.
申请公布号 JPH10242241(A) 申请公布日期 1998.09.11
申请号 JP19970057111 申请日期 1997.02.26
申请人 CANON INC 发明人 YAMADA KOHEI
分类号 H01L21/677;G03F7/20;H01L21/02;H01L21/027;(IPC1-7):H01L21/68 主分类号 H01L21/677
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