| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a polymide optical waveguide in a sort time and inexpensively without using a pressure reducing process such as dry etching. SOLUTION: In this method, polymide acid solution is applied on a substrate 1, on which a lower clad is formed and dried to form a polyamide acid film 3 and resist solution is coasted and dried on it to form a resist 4 and determined pattern is exposed. Then, the resist and polyamide acid film on the substrate are simultaneously developed with alkali aqueous solution and performs patterning and then only resist is removed. Then, the developed polyamide acid pattern is thermally hardened to prepare a designated polymide pattern. |
