发明名称 METHOD AND APPARATUS FOR PREVENTING LASER ENTRANCE WINDOW FROM CONTAMINATION
摘要 <p>PROBLEM TO BE SOLVED: To assuredly change the flying orbit and to effectively prevent evaporated materials from depositing to a laser entrance window, by ionizing the material produced from a work by the laser irradiation, and changing the flying orbit of the ionized material. SOLUTION: For annealing, a laser abrasion is applied to a work 2 to provide an evaporated material, on ionizer 12 irradiates an ultraviolet ray or electrons to ionize this material stably, and an orbit changer 13 immediately changes the orbit of the ionized material by acting on repelling or attracting force for changing the orbit depending on the polarity of the potential in the changer 13. If magnifying this action, the material can be repalled or attracted. The energy of particles dispersed by the abrasion is at most about 100eV.</p>
申请公布号 JPH10242072(A) 申请公布日期 1998.09.11
申请号 JP19970062090 申请日期 1997.02.28
申请人 JAPAN STEEL WORKS LTD:THE 发明人 ISHIDA TOSHIYUKI;SAWAI YOSHIKI
分类号 B23K26/00;B23K26/06;B23K26/16;C23C14/28;H01L21/20;H01L21/268;(IPC1-7):H01L21/268 主分类号 B23K26/00
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