发明名称 |
Cleaning wafer substrates of metal contamination while maintaining wafer smoothness |
摘要 |
Process for cleaning wafer substrates of metal contamination while maintaining wafer smoothness by contacting the wafer substrates with a cleaning composition comprising an aqueous, metal ion-free base and an amphoteric surfactant and optionally a metal complexing agent and a propylene glycol ether organic solvent. |
申请公布号 |
EP0690483(A3) |
申请公布日期 |
1998.09.09 |
申请号 |
EP19950109723 |
申请日期 |
1995.06.22 |
申请人 |
MALLINCKRODT BAKER, INC. |
发明人 |
ILARDI, JOSEPH M.;SCHWARTZKOPF, GEORGE |
分类号 |
C11D1/88;C11D1/90;C11D1/92;C11D3/26;C11D3/43;C11D7/06;C11D7/32;C23G5/02;H01L21/304;H01L21/306 |
主分类号 |
C11D1/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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