Hard material coating formed by PVD

摘要

A 1-5 mu m thick coating of TiAlN or TiAlYN or TiAlCrN or a multilayered coating of TiAlN is formed on a substrate by the ABS method or combined cathodic arc discharge and cathodic sputtering method or just the cathodic arc discharge vapour method. The coating is mechanically ground before being coated with MoS2 in a second PVD process.