发明名称 |
Photomask inspection method and inspection tape therefor |
摘要 |
A method of inspecting a photomask for use in photolithography which accounts for the rounding of corners of features that occurs during manufacture of the photomask. A data tape used in the preparation of the photomask is first provided. An inspection tape is then prepared by modifying the data on the data tape to account for rounding of the features during preparation of the photomask. Finally, an inspection device is used to compare features on the photomask to data on the inspection tape corresponding to such features.
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申请公布号 |
US5804340(A) |
申请公布日期 |
1998.09.08 |
申请号 |
US19960772309 |
申请日期 |
1996.12.23 |
申请人 |
LSI LOGIC CORPORATION |
发明人 |
GARZA, MARIO;CHAO, KEITH K. |
分类号 |
G01N21/956;G03F1/00;(IPC1-7):G03F9/00 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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