发明名称 Aluminum scandium alloy interconnection
摘要 An aluminum interconnection of the invention contains scandium as an impurity, so that the hardness of the interconnection in improved. Moreover, after a thin Al-Sc alloy film is formed, an annealing is performed 80 as to make the crystal grain larger than the width of the interconnection. The resulting Al interconnection has a high resistance against a stressmigration or electromigration, when a current stress in applied at a practical temperature in an LSI. This greatly contributes to the fabrication of a semiconductor device having a fine structure.
申请公布号 US5804879(A) 申请公布日期 1998.09.08
申请号 US19960653116 申请日期 1996.05.24
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OGAWA, SHINICHI;NISHIMURA, HIROSHI;YAMADA, TATSUYA
分类号 H01L21/28;H01L21/768;H01L23/532;(IPC1-7):H01L23/48;H01L23/52;H01L25/40 主分类号 H01L21/28
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