发明名称 |
Catadioptric system for photolithography |
摘要 |
Catadioptric systems are disclosed that project a demagnified image of an object on a substrate. A first optical system substantially collimates a light flux from the object and directs the light flux to a beamsplitter provided with a reflecting surface. A second optical system comprising a concave mirror and a negative lens and having unit magnification receives the light flux from the beamsplitter and directs the light flux back to the beamsplitter. A third optical system then receives the light flux from the beamsplitter and forms an image of the object on the substrate. The catadioptric systems satisfy various conditions.
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申请公布号 |
US5805357(A) |
申请公布日期 |
1998.09.08 |
申请号 |
US19970873528 |
申请日期 |
1997.06.12 |
申请人 |
NIKON CORPORATION |
发明人 |
OMURA, YASUHIRO |
分类号 |
G02B7/28;G02B13/24;G02B17/08;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G02B17/08 |
主分类号 |
G02B7/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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