发明名称 Plasma processing apparatus having a protected microwave transmission window
摘要 A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave introducing member is also provided at a transmission opening with a dielectric member. Preferably, the dielectric member is formed to have a relative dielectric constant of 4 to 10 and an insulation resistance of 108 to 1012 OMEGA .
申请公布号 US5804923(A) 申请公布日期 1998.09.08
申请号 US19960663645 申请日期 1996.06.14
申请人 SUMITOMO METAL INDUSTRIES LIMITED;NIPPON ELECTRIC CO 发明人 IIO, KOUICHI;KOMACHI, KYOUICHI;KATAYAMA, KATSUO;AKIMOTO, TAKESHI
分类号 H05H1/46;C23C16/50;C23C16/511;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):C23C16/00 主分类号 H05H1/46
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