发明名称 Method for manufacturing surface wave devices of the end-face reflection type
摘要 A method of manufacturing a surface wave device of an end-face reflection type comprising forming an IDT 12 on a piezoelectric plate 11, and cutting the piezoelectric plate 11 in a direction which is parallel to the outermost electrode fingers of the IDT within a target area which extends from the out edges of the outermost electrodes to a position lambda /8 outwardly therefrom, lambda being the wavelength of the surface wave generated by the IDT, so as to form opposite end faces of the surface wave device.
申请公布号 US5802685(A) 申请公布日期 1998.09.08
申请号 US19960674248 申请日期 1996.07.01
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KADOTA, MICHIO;MIZOGUCHI, NAOKI
分类号 H03H3/08;H03H9/02;H03H9/145;H03H9/25;(IPC1-7):H01L41/22 主分类号 H03H3/08
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