发明名称 REMOVAL OF SILOXANE FROM SILICON COMPOUND GAS, AND EQUIPMENT THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide an equipment to efficiently remove siloxane, which degrades quality of products in a semiconductor production line, contained in a silicon compound gas, e.g. monosilane, disilane, a halide of monosilane or disilane, silicon tetrafluoride or silicon tetrachloride. SOLUTION: This equipment heats diatomaceous earth M packed in a removal cylinder 2 with a heating means 17A set in the removal cylinder 2, and, at the same time, passes an inert gas, e.g. nitrogen or helium, into the removal cylinder 2 from an inert gas supply line 13 via a reducing valve 5 and inlet valve 6 to activate diatomaceous earth M under heating, and then discharges the gas through an outlet valve 8. Then, the activated diatomaceous earth M is cooled to 60 to 0 deg.C, at the temperature, a silicon compound gas S, e.g. silane, is introduced via the reducing valve 5 and inlet valve 6 into the removal cylinder 2 and brought into contact with the activated diatomaceous earth M to purify the gas S by removing siloxane, and the resultant high-purity silicon compound gas is discharged through a gas discharge pipe 9, and sent to a consumer via the outlet valve 8.</p>
申请公布号 JPH10231113(A) 申请公布日期 1998.09.02
申请号 JP19970036724 申请日期 1997.02.20
申请人 NIPPON SANSO KK 发明人 ABE TOYOHIKO;IKEDA TAKUYA
分类号 B01D53/02;C01B33/04;C01B33/107;(IPC1-7):C01B33/04 主分类号 B01D53/02
代理机构 代理人
主权项
地址